JPH0448725B2 - - Google Patents

Info

Publication number
JPH0448725B2
JPH0448725B2 JP58021749A JP2174983A JPH0448725B2 JP H0448725 B2 JPH0448725 B2 JP H0448725B2 JP 58021749 A JP58021749 A JP 58021749A JP 2174983 A JP2174983 A JP 2174983A JP H0448725 B2 JPH0448725 B2 JP H0448725B2
Authority
JP
Japan
Prior art keywords
silicon
silicon tetrachloride
trichlorosilane
tetrachloride
residual
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58021749A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58172221A (ja
Inventor
Ritsutsuaa Aran
Nabaranguraru Shaa Bakuretsushu
Edowaado Suriba Danieru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS58172221A publication Critical patent/JPS58172221A/ja
Publication of JPH0448725B2 publication Critical patent/JPH0448725B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
    • C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
    • C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10736—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
JP58021749A 1982-02-16 1983-02-14 珪素を処理してクロロシランを製造する方法 Granted JPS58172221A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34940182A 1982-02-16 1982-02-16
US349401 1989-05-08

Publications (2)

Publication Number Publication Date
JPS58172221A JPS58172221A (ja) 1983-10-11
JPH0448725B2 true JPH0448725B2 (en]) 1992-08-07

Family

ID=23372246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58021749A Granted JPS58172221A (ja) 1982-02-16 1983-02-14 珪素を処理してクロロシランを製造する方法

Country Status (3)

Country Link
JP (1) JPS58172221A (en])
DE (1) DE3303903A1 (en])
IT (1) IT1163105B (en])

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3809784C1 (en]) * 1988-03-23 1989-07-13 Huels Ag, 4370 Marl, De
DE3828344C1 (en]) * 1988-08-20 1989-07-06 Huels Ag, 4370 Marl, De
US5530151A (en) * 1995-06-26 1996-06-25 General Electric Company Method of passivating organochlorosilane reactor fines and salvaging chlorosilane values therefrom
US5871705A (en) * 1996-09-19 1999-02-16 Tokuyama Corporation Process for producing trichlorosilane
US6013235A (en) * 1999-07-19 2000-01-11 Dow Corning Corporation Conversion of direct process high-boiling residue to monosilanes
DE102006009954A1 (de) 2006-03-03 2007-09-06 Wacker Chemie Ag Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3704104A (en) * 1970-06-01 1972-11-28 Texas Instruments Inc Process for the production of trichlorosilane
BE792542A (fr) * 1971-12-11 1973-03-30 Degussa Procede pour la fabrication de chlorosilanes exempts de metaux lors de la chloration ou l'hydrochloration de ferrosilicium
DE2630542C3 (de) * 1976-07-07 1981-04-02 Dynamit Nobel Ag, 5210 Troisdorf Verfahren zur Herstellung von Trichlorsilan und Siliciumtetrahlorid
US4307242A (en) * 1980-10-03 1981-12-22 General Electric Company Process for removing impurities from residual silicon powder

Also Published As

Publication number Publication date
IT8319598A0 (it) 1983-02-15
JPS58172221A (ja) 1983-10-11
DE3303903A1 (de) 1983-08-25
IT8319598A1 (it) 1984-08-15
IT1163105B (it) 1987-04-08

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